Last week Hiroshi Ito, co-inventor of the chemically amplified resist (along with C. Grant Willson and Jean Fréchet), passed away after a long illness. Dr. Ito was working as a post-doc under Grant Willson at IBM when they developed the concept and the first example of a chemically amplified photoresist in 1980, now the dominant technology for semiconductor manufacturing. Dr. Ito became an IBM fellow in 2008.