Awards from the SPIE Advanced Lithography Symposium

Here is a recap of the various people who were recognized with awards at this year’s SPIE Advanced Lithography Symposium. (photos by SPIE, http://spie.org/x112637.xml)

Career Achievement Award
Andy Neureuther and Bill Oldham were acknowledged for their “career long contribution to the art and science of lithography.” The award was made “in deep appreciation for your 40 years of visionary guidance and dedication to SPIE society and lithography community.”

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12th Frits Zernike Award
Ralph Dammel, CTO of AZ Electronic Materials

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Fellows of SPIE
Luigi Capodieci, Bernd Geh, Moshe Preil, Masato Shibuya, and Obert Wood

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From the Metrology conference:
Diana Nyyssonen Award for Best Paper in Metrology (2014 conference):
“10nm three-dimensional CD-SEM metrology”, András E. Vladár, John S. Villarrubia, Jasmeet S. Chawla, et al.,

Karel Urbanek Award for Best Student Paper (student lead author at this year’s conference):
“Mechanical and thermal properties of nanomaterials at sub-50nm dimensions characterized using coherent EUV beams”, Kathleen M. Hoogeboom-Pot, Jorge N. Hernandez-Charpak, Travis Frazer, Xiaokun Gu, Emrah Turgut, Univ. of Colorado at Boulder; Erik H. Anderson, Weilun L. Chao, Lawrence Berkeley National Lab.; Justin M. Shaw, National Institute of Standards and Technology; Ronggui Yang, Margaret M. Murnane, Henry C. Kapteyn, Damiano Nardi, Univ. of Colorado at Boulder

From the Patterning Materials conference:
C. Grant Willson Best Paper Award (2014 conference):
“EUV Resists based on Tin-Oxo Clusters”, Brian Cardineau, Ryan Del Re, Hashim Al-Mashat, Miles Marnell, Michaela Vockenhuber, Yasin Ekinci, Chandra Sarma, Mark Neisser, Daniel A. Freedman, and Robert L. Brainard

Hiroshi Ito Memorial Award for the Best Student Paper (2014 conference):
“An insitu hard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrate”, Tandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T. Shaw, Justin D. Holmes and Michael A. Morris

Jeffrey Byers Memorial Best Poster Award (2015 conference):
“EUV Resists Comprised of Main Group Organometallic Oligomeric Materials”, James Passarelli, Brian Cardineau, Ryan Del Re, Miriam Sortland, Michaela Vockenhuber, Yasin Ekinci, Chandra Sarma, Mark Neisser, Daniel A. Freedman, and Robert L. Brainard

From the Design Process Technology Co-Optimization conference:
First Annual Franco Cerrina Memorial Best Student Paper Award (2015 conference):
“Toplogy and context-based pattern extraction using line-segment Voronoi diagram”, Sandeep K. Dey, Univ. della Svizzera Italiana (Switzerland)

From the Optical Lithography conference:
Cymer Best Student Paper Award (2015 conference):
“Characterizing the dependence of thick-mask edge effects on feature size and illumination angle using AIMS images” Aamod Shanker, Andrew R. Neureuther, Laura Waller, Univ. of California, Berkeley; Martin Sczyrba, Advanced Mask Technology Ctr.; Brid Connolly, Toppan Photomasks

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